SPM characterizaton of anomalies in phase-shift mask and their effect on wafer features
- 著者名:
Muckenhirn,S. ( Surface Interface Inc. ) Meyyappan,A. Walch,K. Maslow,M.J. Vandenberghe,G.N. Wingerden,J.Van - 掲載資料名:
- Metrology, Inspection, and Process Control for Microlithography XV
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4344
- 発行年:
- 2001
- 開始ページ:
- 188
- 終了ページ:
- 199
- 総ページ数:
- 12
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819440303 [0819440302]
- 言語:
- 英語
- 請求記号:
- P63600/4344
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
2
国際会議録
Comparisons of 9% versus 6% transmission attenuated phase-shift mask for the 65-nm device mode
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |