Advances in process overlay

Advances in process overlay

著者名:

Hinnen,P.C. ( ASML )

掲載資料名:

Metrology, Inspection, and Process Control for Microlithography XV

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4344

発行年:

2001

開始ページ:

114

終了ページ:

126

総ページ数:

13

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819440303 [0819440302]

言語:

英語

請求記号:

P63600/4344

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012060
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Metrology, inspection, and process control for microlithography
回次:	2001 : 15th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2001.02.26-2001.03.01

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2 国際会議録 Advances in process overlay: alignment solutions for future technology nodes H. Megens, R. van Haren, S. Musa, M. Doytcheva, S. Lalbahadoersing, M. van Kemenade, H. Lee, P. Hinnen, F. van Bilsen SPIE - The International Society of Optical Engineering	8 国際会議録 Improved wafer stepper alignment performance using an enhanced phase grating alignment system Jaap H. M. Neijzen, Robert D. Morton, Peter Dirksen, Henry J. L. Megens, Frank Bornebroek SPIE - The International Society of Optical Engineering
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6 国際会議録 Overlay performance in advanced processes Bornebroek,F., Burghoorn,J., Greeneich,J.S., Megens,H.J., Satriasaputra,D., Simons,G., Stalnaker,S., Koek,B. SPIE - The International Society for Optical Engineering	12 国際会議録 Overlay advanced process control for foundry application Wan, X., Zhou, A., Zhang, F., Li, J., Gu, X., Mos, E.C., Kisteman, A., Wang, V., Schuurhuis, R. SPIE - The International Society of Optical Engineering

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