Evaluation and comparison of the pattern transfer-induced image placement distortions on e-beam projection lithography masks
- 著者名:
Magg,C. ( Photronics/IBM Microelectronics ) Lercel,M.J. Lawliss,M. Ackel,R. Caldwell,N. Kindt,L. Racette,K.C. Williams,C. Reu,P.L. - 掲載資料名:
- Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4343
- 発行年:
- 2001
- 開始ページ:
- 374
- 終了ページ:
- 382
- 総ページ数:
- 9
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819440297 [0819440299]
- 言語:
- 英語
- 請求記号:
- P63600/4343
- 資料種別:
- 国際会議録
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