Evaluation and comparison of the pattern transfer-induced image placement distortions on e-beam projection lithography masks

Evaluation and comparison of the pattern transfer-induced image placement distortions on e-beam projection lithography masks

著者名:

Magg,C. ( Photronics/IBM Microelectronics )

掲載資料名:

Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4343

発行年:

2001

開始ページ:

374

終了ページ:

382

総ページ数:

9

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819440297 [0819440299]

言語:

英語

請求記号:

P63600/4343

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012059
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Emerging lithographic technologies
回次:	2001 : 5th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2001.02.27-2001.03.01

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