Temperture-gradient and composition-spread deposition of epitaxial oxide films and high-throughput characterization

Temperture-gradient and composition-spread deposition of epitaxial oxide films and high-throughput characterization

著者名:

Fukumura,T. ( Tokyo Institute of Technology )

掲載資料名:

Combinatorial and composition spread techniques in materials and device development II : 22-23, 25 January, 2001, San Jose, USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4281

発行年:

2001

開始ページ:

17

終了ページ:

26

総ページ数:

10

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819439598 [0819439592]

言語:

英語

請求記号:

P63600/4281

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00011997
シリーズID:	PA00000029
会議名:	Photonics West - Optoelectronic Materials and Devices : Combinatorial and composition spread techniques in materials and device development
回次:	2001 : 2nd
会議開催地:	San Jose, CA, USA
会議開催年:	2001.01.22-2001.01.23, 2001.01.25

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