Preparation and properties of titanium oxide thin film by midfrequency alternative reactive magnetron sputtering technique

Preparation and properties of titanium oxide thin film by midfrequency alternative reactive magnetron sputtering technique

著者名:

掲載資料名:

Advanced photonic sensors : Technology and applications, 8-10 Novenber 2000, Beijing, China

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4220

発行年:

2000

開始ページ:

34

終了ページ:

38

総ページ数:

5

出版情報:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819438911 [081943891X]

言語:

英語

請求記号:

P63600/4220

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00011939
シリーズID:	PA00000029
会議名:	Optics and Optoelectronic Inspection and Control : Advanced photonic sensors : Technology and applications
回次:	2000
会議開催地:	Beijing, China
会議開催年:	2000.11.08-2000.11.10

類似資料:

1 国際会議録 Reactive DC Magnetron Sputtering of Vanadium Oxide Thin Films C. Batista, J. Mendes, V. Teixeira, J. Carneiro Trans Tech Publications	7 国際会議録 Properties and Electrochromic Performances of Titanium Oxynitride Thin Films Prepared by Reactive Sputtering. Rousselot, C., Chappe, J.-M., Martin, N., Terwagne, G. Electrochemical Society
2 国際会議録 Structure and Optical Properties of ZnO Thin Film Preparation Using RF Magnetron Sputtering S.Y. Quan, L.M. Yang, C. Liu, X.D. Zhang Trans Tech Publications	8 国際会議録 Preparation of Thermochromic Vanadium Dioxide Thin Films by Pulsed-Magnetron Sputtering Xu, Min, Wang, Jie Bing, Li, Lin, Wu, Chun Hua, Zhao, Yin Zhong Trans Tech Publications
3 国際会議録 A Study on the Preparation of TiO2-xNx Films by Reactive Deposition and Their Absorption Properties in Visible Region Zhao, M., Zhuang, D., Zhang, G., Fang, L., Wu, M. Trans Tech Publications	9 国際会議録 Production and Characterization of Carbon Thin Films by the Magnetron Sputtering Technique D.L.C. Silva, L.R.P. Kassab, J.R. Martinelli, A.D. Santos, M.F. Pillis Trans Tech Publications
4 国際会議録 Preparation and properties of IrO2 thin films grown by dc magnetron reactive sputtering method Wang,S., Ding,A., Qiu,P., He,X., Luo,W. SPIE-The International Society for Optical Engineering	10 国際会議録 Study on Copper Nitride Thin Films Prepared by Reactive DC Magnetron Sputtering X.A. Li, J.P. Yang, Y.T. Li, L.X. Wang, H.Y. Wang Trans Tech Publications
5 国際会議録 The Effect of Target to Substrate Distance on the Properties of HAZO Films Deposited by Magnetron Sputtering W.M. Lu, J. Zhang, H.W. Diao, L. Zhao, W.J. Wang Trans Tech Publications	11 国際会議録 Super Smooth Metal Oxide Thin Films Using Closed Field Reactive Magnetron Sputtering J.M. Walls, I.T. Brinkley, D.R. Gibson, E.M. Waddell Society of Vacuum Coaters
6 国際会議録 Process investigation of a-Si:H thin films prepared by DC magnetron sputtering C. Liu, C. Wang, Y. Yao, J. Zhang, Z. Qiao Society of Photo-optical Instrumentation Engineers	12 国際会議録 Properties of Annealed Indium Tin Tantalum Oxide Films Prepared by Reactive Magnetron Sputtering Zhang, Bo Trans Tech Publications

1

2

3

4

5

6

7

8

9

10

11

12