Mask manufacturing contribution on 248-nm and 193-nm lithography performances

Mask manufacturing contribution on 248-nm and 193-nm lithography performances

著者名:

掲載資料名:

20th Annual BACUS Symposium on Photomask Technology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4186

発行年:

2000

開始ページ:

902

終了ページ:

910

総ページ数:

9

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819438492 [0819438499]

言語:

英語

請求記号:

P63600/4186

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00011906
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2000 : 20th
会議開催地:	Monterey, CA, USA
会議開催年:	2000.09.13-2000.09.15

類似資料:

1 国際会議録 Mask manufacturing contribution on 248-nm and 193-nm lithography performances Barberet,A., Fanget,G.L., Richoilley,J.-C., Tissier,M., Quere,Y. SPIE-The International Society for Optical Engineering	7 国際会議録 Positive bilayer resists for 248-and 193-nm lithography Sooriyakumaran,R., Wallraff,G.M., Larson,C.E., Fenzel-Alexander,D., DiPietro,R.A., Opitz,J., Hofer,D.C., … SPIE-The International Society for Optical Engineering
2 国際会議録 Adjustment of optical proximity correction (OPC) software for mask process correction (MPC): Module 2. Lithography simulation based on optical mask writing tool … Barberet, A., Buck, P.D., Fanget, G.L., Toublan, O., Richoilley, J.-C., Tissier, M. SPIE-The International Society for Optical Engineering	8 国際会議録 Effect of mask pattern fidelity on 193-nm lithography performance Cheng, C.C., Su, T.-L., Tsai, F.-G., Tsai, T.-H., Tu, C.-C., Yoo, C.-S. SPIE - The International Society of Optical Engineering
3 国際会議録 Critical procedure for OPC software benchmarking with maskshop consideration Barberet,A., Galan,G., Fanget,G.L., Richoilley,J.-C., Tissier,M., Quere,Y. SPIE-The International Society for Optical Engineering	9 国際会議録 Designing dual-trench alternating phase-shift masks for 140-nm and smaller features using 248-nm KrF and 193-nm ArF lithography Petersen,J.S., Socha,R.J., Naderi,A.R., Baker,C.A., Rizvi,S.A., BanDenBroeke,D., Kachwala,N., Chen,F., Laiding,S., … SPIE-The International Society for Optical Engineering
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