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Double-step process for manufacturing reticle to reduce gate CD variation

著者名:
Kozuma,M.
Komatsu,M.
Arakawa,R.
Kubo,S.
Takahashi,T.
Jensen,J.
Bang,H.S.
Lee,I.H.
Shin,C.
Kim,H.-S.
Park,K.W.
さらに 6 件
掲載資料名:
20th Annual BACUS Symposium on Photomask Technology
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4186
発行年:
2000
開始ページ:
787
終了ページ:
792
総ページ数:
6
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819438492 [0819438499]
言語:
英語
請求記号:
P63600/4186
資料種別:
国際会議録

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