Develop process optimization for CD uniformity improvement
- 著者名:
Shin,J.-C. Won,J.-I. Jung,H.-Y. Kim,M.-S. Choi,Y.-K. Han,O. - 掲載資料名:
- 20th Annual BACUS Symposium on Photomask Technology
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4186
- 発行年:
- 2000
- 開始ページ:
- 540
- 終了ページ:
- 548
- 総ページ数:
- 9
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819438492 [0819438499]
- 言語:
- 英語
- 請求記号:
- P63600/4186
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
3
国際会議録
90-nm-node CD uniformity improvement using a controlled gradient temperature CAR PEB process
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
10
国際会議録
Resolution improvement of chemical-amplification resist using process-induced effect correction
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |