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Dry etching technology of Cr and MoSi layers using high-density plasma source

著者名:
Kwon,H.-J.
Oh,K.-S.
Chang,B.-S.
Choi,B.-Y.
Park,K.-H.
Jeong,S.-H.
さらに 1 件
掲載資料名:
20th Annual BACUS Symposium on Photomask Technology
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4186
発行年:
2000
開始ページ:
532
終了ページ:
539
総ページ数:
8
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819438492 [0819438499]
言語:
英語
請求記号:
P63600/4186
資料種別:
国際会議録

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