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Sub-120-nm technology compatibility of attenuated phase-shift mask in KrF and ArF lithography

著者名:
Ham,Y.-M.
Kim,S.-M.
Kim,S.-J.
Bae,S.-M.
Kim,Y.-D.
Baik,K.-H.
さらに 1 件
掲載資料名:
20th Annual BACUS Symposium on Photomask Technology
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4186
発行年:
2000
開始ページ:
359
終了ページ:
371
総ページ数:
13
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819438492 [0819438499]
言語:
英語
請求記号:
P63600/4186
資料種別:
国際会議録

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