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Potentialities of sub-100-nm optical lithography of alternating and phase-edge phase-shift mask for ArF lithography

著者名:
Koo,S.-S.
Kim,H.-B.
Yune,H.-S.
Hong,J.-S.
Paek,S.-W.
Eom,T.-S.
Ahn,C.-N.
Ham,Y.-M.
Baik,K.-H.
Lee,K.-Y.
Kim,L.-J.
Kim,H.-S.
さらに 7 件
掲載資料名:
20th Annual BACUS Symposium on Photomask Technology
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4186
発行年:
2000
巻:
4186
開始ページ:
346
終了ページ:
358
総ページ数:
13
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819438492 [0819438499]
言語:
英語
請求記号:
P63600/4186
資料種別:
国際会議録

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