Potentialities of sub-100-nm optical lithography of alternating and phase-edge phase-shift mask for ArF lithography
- 著者名:
Koo,S.-S. Kim,H.-B. Yune,H.-S. Hong,J.-S. Paek,S.-W. Eom,T.-S. Ahn,C.-N. Ham,Y.-M. Baik,K.-H. Lee,K.-Y. Kim,L.-J. Kim,H.-S. - 掲載資料名:
- 20th Annual BACUS Symposium on Photomask Technology
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4186
- 発行年:
- 2000
- 開始ページ:
- 346
- 終了ページ:
- 358
- 総ページ数:
- 13
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819438492 [0819438499]
- 言語:
- 英語
- 請求記号:
- P63600/4186
- 資料種別:
- 国際会議録
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2
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Sub-120-nm technology compatibility of attenuated phase-shift mask in KrF and ArF lithography
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SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |