Effect of mask reduction ratio in alternating phase-shift masks

Effect of mask reduction ratio in alternating phase-shift masks

著者名:

Shin,I.-G.

掲載資料名:

20th Annual BACUS Symposium on Photomask Technology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4186

発行年:

2000

開始ページ:

309

終了ページ:

315

総ページ数:

7

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819438492 [0819438499]

言語:

英語

請求記号:

P63600/4186

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00011906
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2000 : 20th
会議開催地:	Monterey, CA, USA
会議開催年:	2000.09.13-2000.09.15

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1 国際会議録 Doubly exposed patterning characteristics using two alternating phase-shift masks Lee,S.-W., Shin,I.-G., Kim,Y.-H., Choi,S.-W., Han,W.-S., Yoon,H.-S., Sohn,J.-M. SPIE-The International Society for Optical Engineering	7 国際会議録 Application of alternating phase shift mask to device fabrication S.-G. Kim, S.-G. Woo, W.-S. Han, Y.-B. Koh, M.-Y. Lee Society of Photo-optical Instrumentation Engineers
2 国際会議録 Doubly exposed patterning using mutually one-pitch step-shifted alternating phase-shift masks Lee,S.-W., Chung,D.-H., Shin,I.-G., Kim,Y.-H., Choi,S.-W., Han,W.-S., Sohn,J.-M. SPIE-The International Society for Optical Engineering	8 国際会議録 Phase-defocus windows for alternating phase-shifting mask Liang, F. -J., Chen, C. -K., Shin, J. -J., You, J. -W., Lin, C. -H., Pan, Z. -Y., Shu, K. -C., Gau, T. -S., Lin, B. J. SPIE - The International Society of Optical Engineering
3 国際会議録 Feasibility evaluations of alternating phase-shift mask for imaging sub-80nm feature with KrF Kang, M.-A., Kim, S.-H., Shin, I.-K., Choi, S.-W., Sohn, J.-M. SPIE-The International Society for Optical Engineering	9 国際会議録 Analysis of dry etch loading effect in mask fabrication Lee,J.-Y., Cho,S.-Y., Kim,C.-H., Lee,S.-W., Choi,S.-W., Han,W.-S., Sohn,J.-M. SPIE-The International Society for Optical Engineering
4 国際会議録 Analytical approach to X-phenomenon in alternating phase-shifting masks Park, J.R., Kim, S.-H., Lee, H.-J., Jang, I.-Y., Choi, Y.-H., Yang, S.-H., Lee, Y.-H., Kim, Y.-H., Choi, S.-W., Yoon, … SPIE-The International Society for Optical Engineering	10 国際会議録 Potentialities of sub-100-nm optical lithography of alternating and phase-edge phase-shift mask for ArF lithography Koo,S.-S., Kim,H.-B., Yune,H.-S., Hong,J.-S., Paek,S.-W., Eom,T.-S., Ahn,C.-N., Ham,Y.-M., Baik,K.-H., Lee,K.-Y., … SPIE-The International Society for Optical Engineering
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6 国際会議録 Application of alternating phase-shifting masks to sub-quarter-micrometer contact holes Lim,S.-C., Kye,J.-W., Woo,S.-G., Kim,S.-G., Kang,H.-Y., Han,W.-S., Koh,Y.-B. SPIE-The International Society for Optical Engineering	12 国際会議録 TiSi-nitride-based attenuated phase-shift mask for ArF Lithography Koo,S.-S., Hur,I.-B., Koo,Y.-M., Baik,K.-H., Choi,I.-H., Kim,L.-J., Park,K.-T., Shin,C. SPIE - The International Society for Optical Engineering

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