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KrF attenuated PSM defect printability and detectability for 120-nm actual DRAM patterning process

著者名:
Kim,J.
Kim,S.-C.
Kim,H.-C.
Lee,S.-I.
Choi,Y.-K.
Ham,Y.-M.
Han,O.
さらに 2 件
掲載資料名:
20th Annual BACUS Symposium on Photomask Technology
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4186
発行年:
2000
開始ページ:
287
終了ページ:
296
総ページ数:
10
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819438492 [0819438499]
言語:
英語
請求記号:
P63600/4186
資料種別:
国際会議録

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