Extreme-ultraviolet source development: a comparison of different concepts

Extreme-ultraviolet source development: a comparison of different concepts

著者名:

掲載資料名:

Soft X-ray and EUV imaging systems : 3-4 August 2000, San Diego, USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4146

発行年:

2000

開始ページ:

113

終了ページ:

120

総ページ数:

8

出版情報:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819437914 [0819437913]

言語:

英語

請求記号:

P63600/4146

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00011871
シリーズID:	PA00000029
会議名:	Optics & Photonics : Soft X-Ray and EUV Imaging Systems
回次:	2000
会議開催地:	San Diego, CA, USA
会議開催年:	2000.08.03-2000.08.04

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