Lithography: a look at what is ahead
- 著者名:
- Levinson,H.J.
- 掲載資料名:
- Optical metrology roadmap for the semiconductor, optical, and data storage industries , 30-31 July 2000, San Diego, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4099
- 発行年:
- 2000
- 開始ページ:
- 1
- 終了ページ:
- 15
- 総ページ数:
- 15
- 出版情報:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819437440 [0819437441]
- 言語:
- 英語
- 請求記号:
- P63600/4099
- 資料種別:
- 国際会議録
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11
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Architectural choices for EUV lithography masks: patterned absorbers and patterned reflectors
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