Characterization of Ta2O5 thin films with small current leakage for high density DRAMS
- 著者名:
Kanda, N. Furukawa, R. Ishibashi, M. Kunitomo, M. Homma, T. Takahashi, M. Uemura, T. Kanai, M. Kubo, M. Ogata, K. Yoshida, T. Yamamoto, H. Ohji, Y. - 掲載資料名:
- Structure and electronic properties of ultrathin dielectric films on silicon and related structures : symposium held November 29-December 1, 1999, Boston, Massachusetts, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 592
- 発行年:
- 2000
- 開始ページ:
- 129
- 出版情報:
- Warrendale, PA: MRS-Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558995000 [1558995005]
- 言語:
- 英語
- 請求記号:
- M23500/592
- 資料種別:
- 国際会議録
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