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Deposition and characterization of ultrathin Ta2O5 layers deposited on silicon from a Ta(OC2H5)5 precursor

著者名:
Chaneliere, C.
Autran, J. L.
Raynard, J. P.
Michailos, M.
Barla, K.
Ushikawa, H.
Hiroe, A.
Shimomura, K.
Kakimoto, A.
さらに 4 件
掲載資料名:
Structure and electronic properties of ultrathin dielectric films on silicon and related structures : symposium held November 29-December 1, 1999, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
592
発行年:
2000
開始ページ:
75
出版情報:
Warrendale, PA: MRS-Materials Research Society
ISSN:
02729172
ISBN:
9781558995000 [1558995005]
言語:
英語
請求記号:
M23500/592
資料種別:
国際会議録

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