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Precise characterization of ultrathin nitride/oxide gate dielectrics by grazing X-ray reflectance and spectroscopic ellipsometry

著者名:
掲載資料名:
Structure and electronic properties of ultrathin dielectric films on silicon and related structures : symposium held November 29-December 1, 1999, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
592
発行年:
2000
開始ページ:
63
出版情報:
Warrendale, PA: MRS-Materials Research Society
ISSN:
02729172
ISBN:
9781558995000 [1558995005]
言語:
英語
請求記号:
M23500/592
資料種別:
国際会議録

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