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Nitrogen Implantation and Diffusion in Silicon

著者名:
Adam, L. S.
Law, M. E.
Dokumaci, O.
Haddara, Y.
Murthy, C.
Park, H.
Hegde, S.
Chidambarrao, D.
Mollis, S.
Domenicucci, T.
Dziobkowski, C.
Jones, K.
Wong, P.
Young, R.
Srinivasan, R.
さらに 10 件
掲載資料名:
Si front-end processing - physics and technology of dopant-defect interactions : symposium held April 6-9, 1999, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
568
発行年:
1999
開始ページ:
277
出版情報:
Warrendale, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558994751 [1558994750]
言語:
英語
請求記号:
M23500/568
資料種別:
国際会議録

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