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Ultra-Low Energy Boron Implants in Crystalline Silicon: Atomic Transport Properties and Electrical Activation

著者名:
Napolitani, E.
Carnera, A.
Privitera, V.
Magna, A. La
Schroer, E.
Priolo, F.
Mannino, G.
Moffatt, S.
さらに 3 件
掲載資料名:
Si front-end processing - physics and technology of dopant-defect interactions : symposium held April 6-9, 1999, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
568
発行年:
1999
開始ページ:
43
出版情報:
Warrendale, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558994751 [1558994750]
言語:
英語
請求記号:
M23500/568
資料種別:
国際会議録

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