RuO2 THIN FILMS AS BOTTOM ELECTRODES FOR HIGH DIELECTRIC CONSTANT MATERIALS

RuO2 THIN FILMS AS BOTTOM ELECTRODES FOR HIGH DIELECTRIC CONSTANT MATERIALS

著者名:

Yoshikawa, K.

掲載資料名:

Polycrystalline thin films : structure, texture, properties, and applications : symposium held April 4-8, 1994, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

343

発行年:

1994

開始ページ:

511

出版情報:

Pittsburgh, PA: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558992436 [155899243X]

言語:

英語

請求記号:

M23500/343

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00020769
シリーズID:	PA00000011
会議名:	Symposium on polycrystalline thin films
回次:	1994
会議開催地:	San Francisco, CA, USA
会議開催年:	1994.04.04-1994.04.08

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