Monitoring optical properties and thickness of PECVD SiON antireflective layer by spectroscopic ellipsometry

Monitoring optical properties and thickness of PECVD SiON antireflective layer by spectroscopic ellipsometry

著者名:

掲載資料名:

Metrology, Inspection, and Process Control for Microlithography XI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3050

発行年:

1997

開始ページ:

602

終了ページ:

606

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819424648 [0819424641]

言語:

英語

請求記号:

P63600/3050

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00020766
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
回次:	1997 : 11th
会議開催地:	Santa Clara, CA, USA
会議開催年:	1997.03.10-1997.03.12

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