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High-etch-rate anisotropic deep silicon plasma etching for the fabrication of microsensors

著者名:
掲載資料名:
Micromachining and microfabrication process technology II : 14-15 October, 1996, Austin, Texas
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
2879
発行年:
1996
開始ページ:
94
終了ページ:
102
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819422774 [0819422770]
言語:
英語
請求記号:
P63600/2879
資料種別:
国際会議録

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