Optical characterization of surface effects from Cu-contaminated SiO2/Si interfaces
- 著者名:
- Wang,X. ( Univ.of Arizona )
- Parks,H.G.
- Cariss,C.
- Lowell,J.K.
- 掲載資料名:
- Optical Characterization Techniques for High-Performance Microelectronic Device Manufacturing II
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 2638
- 発行年:
- 1995
- 開始ページ:
- 246
- 終了ページ:
- 255
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819420046 [0819420042]
- 言語:
- 英語
- 請求記号:
- P63600/2638
- 資料種別:
- 国際会議録
類似資料:
Electrochemical Society |
MRS - Materials Research Society |
Materials Research Society |
Trans Tech Publications |
Materials Research Society |
Electrochemical Society |
Materials Research Society |
SPIE - The International Society for Optical Engineering |
Trans Tech Publications |
Trans Tech Publications |
6
国際会議録
An Optical Approach to Evaluating the Effects of Chlorine on the Quality of Si/SiO2 Interfaces
MRS - Materials Research Society |
Trans Tech Publications |