Surface photovoltage analysis of iron contamination in silicon processing and the relation to gate oxide integrity
- 著者名:
- Henley,W.B. ( Univ.of South Florida )
- 掲載資料名:
- Optical Characterization Techniques for High-Performance Microelectronic Device Manufacturing II
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 2638
- 発行年:
- 1995
- 開始ページ:
- 172
- 終了ページ:
- 182
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819420046 [0819420042]
- 言語:
- 英語
- 請求記号:
- P63600/2638
- 資料種別:
- 国際会議録
類似資料:
MRS - Materials Research Society |
Materials Research Society |
Electrochemical Society |
MRS - Materials Research Society |
9
国際会議録
Organic Contamination of Silicon Wafer in Clean Room Air and Its Impact to Gate Oxide Integrity
MRS - Materials Research Society | |
MRS - Materials Research Society |
10
国際会議録
Organic Contamination of Silicon Wafer in Clean Room Air and Its Impact to Gate Oxide Integrity
MRS - Materials Research Society |
Electrochemical Society | |
MRS - Materials Research Society |
Materials Research Society |