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Multiparameter process metrology using scatterometry

著者名:
Raymond,C.J. ( Univ.of New Mexico )
Murnane,M.R.
Prins,S.L.
Sohail,S.
Naqvi,S.H.
McNeil,J.R.
さらに 1 件
掲載資料名:
Optical Characterization Techniques for High-Performance Microelectronic Device Manufacturing II
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
2638
発行年:
1995
開始ページ:
84
終了ページ:
93
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819420046 [0819420042]
言語:
英語
請求記号:
P63600/2638
資料種別:
国際会議録

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