Phaase Formation Sequence of Nickel Silicides from Rapid Thermal Annealing of Ni on 4H-SiC
- 著者名:
Madsen,L.D. Svedberg,E.B. Radamson,H.H. Hallin,C. Hjorvarsson,B. ,C.Cabrai.Jr. Jordan-Sweet,J.L. Liavoie,C. - 掲載資料名:
- Silicon carbide, III-nitrides and related materials, ICSCIII-N'97 : proceedings of the International Conference on Silicon Carbide, III-Nitrides and Related Materials, Stockholm, Sweden, September 1997
- シリーズ名:
- Materials science forum
- シリーズ巻号:
- 264-268
- 発行年:
- 1998
- 巻:
- Part2
- 開始ページ:
- 799
- 終了ページ:
- 804
- 出版情報:
- Zuerich, Switzerland: Trans Tech Publications
- ISSN:
- 02555476
- ISBN:
- 9780878497928 [0878497927]
- 言語:
- 英語
- 請求記号:
- M23650
- 資料種別:
- 国際会議録
類似資料:
1
国際会議録
In Situ Monitoring of Thin Film Reactions During Rapid Thermal Annealing: Nickel Silicide Formation
Electrochemical Society |
Materials Research Society |
Trans Tech Publications |
Materials Research Society |
MRS - Materials Research Society |
Trans Tech Publications |
Trans Tech Publications |
Trans Tech Publications |
MRS - Materials Research Society |
Trans Tech Publications |
Trans Tech Publications |
Trans Tech Publications |