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High-etch-rate deep anisotropic plasma etching of silicon for MEMS fabrication

著者名:
Pandhumsoporn,T. ( Alcatel Comptech Inc. )
Wang.L. ( Alcatel Comptech Inc. )
Feldbaum,M. ( Alcatel Comptech Inc. )
Gadgil,P. ( Alcatel Comptech Inc. )
Puech,M. ( Alcatel CIT (France) )
Maquin,P. ( Alcatel CIT (France) )
さらに 1 件
掲載資料名:
Smart structures and materials 1998 : smart electronics and MEMS : 2-4 March 1998, San Diego, California
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3328
発行年:
1998
開始ページ:
93
終了ページ:
101
出版情報:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427724 [0819427721]
言語:
英語
請求記号:
P63600/3328
資料種別:
国際会議録

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