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Defining conditions for the etching of silicon in an inductive coupled plasma reactor

著者名:
Ashraf, H.
Bhardwaj, J. K.
Guibarra, E.
Hall, S.
Hopkins, J.
Hynes, A. M.
Johnston, I.
Lea, L.
McCauley, S.
Nicholls, G.
O'Brien, P.
さらに 6 件
掲載資料名:
Materials science of microelectromechanical systems (MEMS) devices II : symposium held November 29-December 1, 1999, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
605
発行年:
2000
開始ページ:
299
出版情報:
Warrendale, Pa.: MRS-Materials Research Society
ISSN:
02729172
ISBN:
9781558995130 [1558995137]
言語:
英語
請求記号:
M23500/605
資料種別:
国際会議録

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