CHARACTERIZATION OF EPITAXIAL CoSi2 FILM GROWTH ON Si(100) BY SLOW POSITRON BEAM

CHARACTERIZATION OF EPITAXIAL CoSi2 FILM GROWTH ON Si(100) BY SLOW POSITRON BEAM

著者名:

Liu, Ping

掲載資料名:

Silicides, germanides, and their interfaces : Symposium held November 29-December 2, 1993, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

320

発行年:

1994

開始ページ:

233

出版情報:

Pittsburgh, PA: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558992191 [1558992197]

言語:

英語

請求記号:

M23500/320

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00020321
シリーズID:	PA00000011
会議名:	Symposium on silicides, germanides, and their interfaces
回次:	1993
会議開催地:	Boston, MA, USA
会議開催年:	1993.11.29-1993.12.02

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