Removal of Fluorine from a Si(100) Surface by a Remote rf hydrogen Plasma

Removal of Fluorine from a Si(100) Surface by a Remote rf hydrogen Plasma

著者名:

掲載資料名:

Ultraclean semiconductor processing technology and surface chemical cleaning and passivation : Symposum held April 17-19, 1995, San Francisco, California, USA

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

386

発行年:

1995

開始ページ:

357

出版情報:

Pittsburgh, PA: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558992894 [1558992898]

言語:

英語

請求記号:

M23500/386

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00020319
シリーズID:	PA00000011
会議名:	Symposium on ultraclean semiconductor processing technology and surface chemical cleaning and passivation
回次:	1995
会議開催地:	San Francisco, CA, USA
会議開催年:	1995.04.17-1995.04.19

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