Controlled Nitrogen-Atom Incorporation at Si-SiO2 Interfaces in MIS Devices
- 著者名:
- 掲載資料名:
- Ultraclean semiconductor processing technology and surface chemical cleaning and passivation : Symposum held April 17-19, 1995, San Francisco, California, USA
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 386
- 発行年:
- 1995
- 開始ページ:
- 243
- 出版情報:
- Pittsburgh, PA: MRS - Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558992894 [1558992898]
- 言語:
- 英語
- 請求記号:
- M23500/386
- 資料種別:
- 国際会議録
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5
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Controlled Nitrogen Incorporation at Si-SiO2 Interfaces by Re- mote Plasma Assisted Processing
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