Studies of the Relationship Between Megasonics, Surface Etching, and Particle Removal in SC-1 Solutions

Studies of the Relationship Between Megasonics, Surface Etching, and Particle Removal in SC-1 Solutions

著者名:

Cohen, S. L.

掲載資料名:

Ultraclean semiconductor processing technology and surface chemical cleaning and passivation : Symposum held April 17-19, 1995, San Francisco, California, USA

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

386

発行年:

1995

開始ページ:

13

出版情報:

Pittsburgh, PA: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558992894 [1558992898]

言語:

英語

請求記号:

M23500/386

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00020319
シリーズID:	PA00000011
会議名:	Symposium on ultraclean semiconductor processing technology and surface chemical cleaning and passivation
回次:	1995
会議開催地:	San Francisco, CA, USA
会議開催年:	1995.04.17-1995.04.19

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2 国際会議録 SUB 1OOnm PARTICLE REMOVAL WITH DEIONIZED WATER AND A MEGASONIC FREQUENCY OF 835kHz Lauerhaas, J., Wu, Y., Xu, K., Vereecke, G., Vos, R., Kenis, K., Mertens, P., Nicolosi, T., Heyns, M. Electrochemical Society	8 国際会議録 A DESIGN OF EXPERIMENTS APPROACH TO AN OPTIMIZED SC-1/MEGASONIC CLEAN FOR SUB-0.15 MICRON PARTICLE REMOVAL Resnick, P.J., Adkins, C.L.J., Clews, P.J., Thomas, E.V., Cannaday, S.T. Electrochemical Society
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4 国際会議録 EVALUATION OF MEGASONIC CLEANING SYSTEMS FOR PARTICLE REMOVAL EFFICIENCY AND DAMAGING Vereecke, G., Holsteyns, F., Veltens, J., Lux, M., Amauts, S., Kenis, K., Vos, R., Mertens, P., Heyns, M. Electrochemical Society	10 国際会議録 PECULIARITIES OF HOT PHOSPHORIC ACID USED IN ETCHING SILICON NITRIDE Syverson, W., Fleming, M. Electrochemical Society
5 国際会議録 Local Removal Frequency of Nano Particles in Megasonic Cleaning T. Janssens, K.L. Wostyn, S. Arnauts, A. De Geyter, T. Bearda Electrochemical Society	11 国際会議録 Particle Removal from Micrometer-Sized Trenches Using High-Velocity-Aerosol Cleaning and Comparison with Megasonic Tank Cleaning K.L. Wostyn, K. Sano, A. Eitoku, T. Janssens, T. Bearda Electrochemical Society
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