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Remote Plasma-Enhanced-Metal Organic Chemical Vapor Deposition of Zirconium Oxide/Silicon Oxide Alloy, (ZrO2)x-(SiO2)1-x (x ｡？0.5), Thin Films for Advanced High-K Gate Dielectrics

著者名:
Wolfe, D.
Flock, K.
Therrien, R.
Johnson, R.
Rayner, B.
Gunther, L.
Brown, N.
Claflin, B.
Lucovsky, G.
さらに 4 件
掲載資料名:
Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
567
発行年:
1999
開始ページ:
343
出版情報:
Warrendale, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558994744 [1558994742]
言語:
英語
請求記号:
M23500/567
資料種別:
国際会議録

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