Blank Cover Image

Growth of Thin SiO2 by "Spike" Rapid Thermal Oxidation

著者名:
Fiory, A. T.  
掲載資料名:
Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
567
発行年:
1999
開始ページ:
13
出版情報:
Warrendale, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558994744 [1558994742]
言語:
英語
請求記号:
M23500/567
資料種別:
国際会議録

類似資料:

1 国際会議録 Rapid Thermal Annealing and Oxidation of Silicon Wafers With Back-Side Films

Fiory, A. T.

MRS - Materials Research Society
7 国際会議録 Flat-Band Voltage Study of Atomic-Layer-Deposited Aluminum-Oxide Subjected to Spike Thermal Annealing

Mehta, V. R., Fiory, A. T., Ravindra, N. M., Ho, M. Y., Wilk, G. D., Sorsch, T. W.

Materials Research Society
2 国際会議録 Ultra-Shallow Junctions by Ion Implantation and Rapid Thermal Annealing: Spike-Anneals, Ramp Rate Effects

Agarwal, A., Gossmann, H-J., Fiory, A. T.

MRS - Materials Research Society
8 国際会議録 Corona-Charge Evaluation of Thermal SiO2 Growth by Single-Wafer and Batch Methods

Fiory, A., Zhang, J., Frisella, P., Hebb, J., Agarwal, A.

Electrochemical Society
3 国際会議録 Silicon Rapid Thermal Processing With Ripple Pyrometry

Fiory, A. T.

MRS - Materials Research Society
9 国際会議録 CHARACTERISTICS OF THIN LAYERS OF SiO2 FABRICATED BY RAPID THERMAL OXIDATION

Prasad, S., Haase, J., Fru?chtnicht, R., Ferretti, R., Haack, D.

Materials Research Society
4 国際会議録 RIPPLE PYROMETRY FOR RAPID THERMAL ANNEALING

Fiory, A. T., Nanda, A. K.

MRS - Materials Research Society
10 国際会議録 ION CHANNELING AND SPECTROSCOPIC ELLIPSOMETRY EXAMINATIONS OF THIN-FILM SiO2/EPI-Si(001) STRUCTURES

Fiory, A.T., Roy, P. K., Jellison, G.E.

Materials Research Society
5 国際会議録 A SPECTROELLIPSOMETRY STUDY OF THE GROWTH KINETICS AND OF THE REFRACTIVE INDEX OF VERY THIN SiO2 LAYERS GROWN BY RAPID THERMAL OXIDATION

Gono, N., Barbier, D., Gagnaire, A.

Materials Research Society
11 国際会議録 Temperature Monitoring by Ripple Pyrometry in Rapid Thermal Processing

Nguyenphu, Binh, Oh, Minseok, Fiory, Anthony T.

MRS - Materials Research Society
6 国際会議録 STRESS GRADIENTS IN SiO2 THIN FILMS PREPARED BY THERMAL OXIDATION AND SUBJECTED TO RAPID THERMAL ANNEALING

Bjorkman, C. H., Fitch, J. T., Lucovsky, G.

Materials Research Society
12 国際会議録 In-Line Temperature Monitoring of Rapid Thermal Annealing Processes

Oh, Minseok, Nguyenphu, Binh, Fiory, Anthony T.

MRS - Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12