Measurements of the Diffusion of Iron and Carbon in Single-Crystal NiAl Using Ion Implantation and Secondary Ion Mass Spectrometry

Measurements of the Diffusion of Iron and Carbon in Single-Crystal NiAl Using Ion Implantation and Secondary Ion Mass Spectrometry

著者名:

掲載資料名:

Diffusion mechanisms in crystalline materials : symposium held April 13-16, 1998, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

527

発行年:

1998

開始ページ:

227

出版情報:

Warrendale, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558994331 [1558994335]

言語:

英語

請求記号:

M23500/527

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00020315
シリーズID:	PA00000011
会議名:	Symposium on diffusion mechanisms in crystalline materials
回次:	1998
会議開催地:	San Francisco, CA, USA
会議開催年:	1998.04.13-1998.04.16

類似資料:

1 国際会議録 Phosphorus / Silicon Interstitial Annealing After Ion Implantation Keys, P. H., Brindos, R., Krishnamoorthy, V., Puga-Lambers, M., Jones, K. S., Law, Mark E. Materials Research Society	7 国際会議録 Molecular Secondary Ion Mass Spectrometry Pachuta, Steven J., Cooks, R. Graham American Chemical Society
2 国際会議録 OXIDE FORMATION ON NbAl3 AND TiAl DUE TO ION IMPLANTATION OF 18O Hanrahan, Robert J., Jr., Verink, Ellis D., Jr., Withrow, Stephen P., Ristolainen, Eero O. MRS - Materials Research Society	8 国際会議録 Surface Sensitivity of Electron Energy Loss Spectroscopy and Secondary-Ion Mass Spectrometry of Organic Films Pomerantz, M., Purtell, R. J., Twieg, R. J., Chuang, S.-F., Reuter, W., Eldridge, B. N., Novak, F. P. American Chemical Society
3 国際会議録 ACCUMULATION OF IMPLANTATION DAMAGE IN MeV IMPLANTED DIAMOND CRYSTALS Hunn, John D., Withrow, S. P., Clausing, R. E., Heatherly, L., Bentley, J., Hembree, D. M., Jr., Parikh, N. R. MRS - Materials Research Society	9 国際会議録 Formation of Ferromagnetic FePt Nanoparticles by Ion Implantation White, C.W., Withrow, S.P., Budai, J.D., Boatner, L.A., Sorge, K.D., Thompson, J.R., Beaty, K.S., Meldrum, A. Materials Research Society
4 国際会議録 HIGH TEMPERATURE IMPLANTATION OF SINGLE CRYSTAL BETA SILICON CARBIDE THIN FILMS Edmond, J.A., Withrow, S.P., Wadlin, W., Davis, R.F. Materials Research Society	10 国際会議録 Ion Implantation and Secondary Ion Mass Spectrometry of Compound Semiconductors Wilson, R G. Electrochemical Society
5 国際会議録 Semiquantitative analysis of atherosclerotic plaque using optical coherence tomography and time-of-flight secondary ion mass spectrometry Korol, R.M., Togonu-Bickersteth, B., Yang, V.X., Dimov, S., Vatsya, P., Gordon, M., Vitkin, A., Liu, L., Canham, P., … SPIE-The International Society for Optical Engineering	11 国際会議録 Photon burst mass spectrometry for the measurement of 85Kr at ambient levels Fairbank,W.M.,Jr., Hansen,C.S., LaBelle,R.D., Pan,X.-J., Zhang,Y., Chamberlin,E.P., Nogar,N.S.(deceased), Miller,C.M., … SPIE-The International Society for Optical Engineering
6 国際会議録 Characterization of TiAl Alloys by Secondary Ion Mass Spectrometry Barbosa, J., Teodoro, O.M.N.D., Moutinho, A.M.C., Ribeiro, S., Monteiro, C. Trans Tech Publications	12 国際会議録 INVESTIGATION OF TITANIUM SILICIDE FORMATION USING SECONDARY ION MASS SPECTROMETRY Wee, A. T. S., Huan, A. C. H., Thian, W. H., Tan, K. L., Hogan, R. MRS - Materials Research Society

1

2

3

4

5

6

7

8

9

10

11

12