Blank Cover Image

Silicon Surface Metal Contamination Measurements Using Grazing-Emission XRF Spectrometry

著者名:
Gendt, S. de
Kenis, K.
Baeyens, M.
Mertens, P. W.
Heyns, M. M.
Wiener, G.
Kidd, S. J.
Knotter, D. M.
Bokx, P. K. de
さらに 4 件
掲載資料名:
Science and technology of semiconductor surface preparation : symposium held April 1-3, 1997, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
477
発行年:
1997
開始ページ:
397
出版情報:
Pittsburgh, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558993815 [1558993819]
言語:
英語
請求記号:
M23500/477
資料種別:
国際会議録

類似資料:

1 国際会議録 GRAZINGEMISSION X-RAY FLUORESCENCE SPECTROMETRY: A NOVEL TOOL FOR SURFACE CONTAMINATION ANALYSIS AND THIN FILM METROLOGY

deBokx, P.K., Kidd, S.J., Wiener, G., Urbach, H.P., De Gendt, S., Mertens, P.W., Heyns, M.M.

Electrochemical Society
7 国際会議録 Capabilities of TOF-SIMS to Study the Influence of Different Oxidation Conditions on Metal Contamination Redistribution

Witte,H.De, Cendt,S.De, Douglas,M., Connard,T., Kenis,K., Mertens,P.W., Vandervorst,W., Gijbels,R.

SPIE - The International Society for Optical Engineering
2 国際会議録 Effect of Metal Contamination and Improved Cleaning Strategies

Mertens, P.W., Bearda, T., Lowewenstein, L.M., Martin, A.R., Hub, W., Kolbesen, B.O., Teerlink, I., Vos, R., Baeyens, …

Electrochemical Society
8 国際会議録 Lattice Defects in High Quality As-Grown CZ Silicon,Studied with Light Scattering and Preferential Etching Techniques

Vanhellemont,J., Kissinger,G., Graf,D., Kenis,K., Depas,M., Mertens,P., Lambert,U., Heyns,M., Claeys,C., Richter,H., …

Trans Tech Publications
3 国際会議録 EVALUATION OF Si SURFACE CONDITIONS BY THE USE OF A SURFACE PHOTOVOLTAGE TECHNIQUE

Trauwaert, M.-A., Kenis, K., Caymax, M., Mertens, P.W., Heyns, M.M., Vanhellemont, J., Graf, D., Wagner, P.

Electrochemical Society
9 国際会議録 Electrochemical Study of Copper Deposition on Silicon Surfaces in HF Solutions

Teerlinek, I., Gomes, W.P., Strubbe, K., Mertens, P.W., Heyns, M.M.

Electrochemical Society
4 国際会議録 QUANTITATIVE MODELING OF H2O2 DECOMPOSITION IN SC1

Mertens, P., Baeyens, M., Moyaerts, G., Okorn-Schmidt, H., Vos, R., De Waele, R., Hatcher, Z., Hub, W., De Gendt, S., …

Electrochemical Society
10 国際会議録 In-situ and real time characterization of wet chemical silicon surface processes by electrochemical open circuit potential measurements

Schmidt, H.F, Teerlinck, I., Meuris, M., Mertens, P.W., Heyns, M.M.

Electrochemical Society
5 国際会議録 *CLEANING OF METAL CONTAMINATION

Mertens, P.W., Hurd, T.Q., Graf, D., Meuris, M., Schmidt, H.F., Heyns, M.M.

Electrochemical Society
11 国際会議録 EVALUATION OF MEGASONIC CLEANING SYSTEMS FOR PARTICLE REMOVAL EFFICIENCY AND DAMAGING

Vereecke, G., Holsteyns, F., Veltens, J., Lux, M., Amauts, S., Kenis, K., Vos, R., Mertens, P., Heyns, M.

Electrochemical Society
6 国際会議録 SILICON SURFACE ROUGHENING BY THE DECOMPOSITION OF HYDROGEN PEROXIDE

Mertens, P.W., Verhaverbeke, S., Heyns, M.M., Hellemans, L., Snauwaert, J., Dillenbeck, K.

Electrochemical Society
12 国際会議録 REDUCTION OF SURFACE METALLIC CONTAMINATION THROUGH OPTIMIZED RINSING AND SINGLE-WAFER DRYING

Fyen, W., Holsteyns, F., Lauerhaas, J., Bearda, T., Mertens, P., Heyns, M.

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12