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Characterization of Copper Diffusion into Al and Al-1% Si Polycrystalline Thin Films

著者名:
掲載資料名:
Polycrystalline thin films II : structure, properties, and applications : symposium held November 27-December 1, 1995, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
403
発行年:
1996
開始ページ:
663
出版情報:
Pittsburgh, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558993068 [1558993061]
言語:
英語
請求記号:
M23500/403
資料種別:
国際会議録

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