IN-SITU X-RAY DIFFRACTION AND RESISTIVITY ANALYSIS OF CoSi2 PHASE FORMATION WITH AND WITHOUT A Ti INTERLAYER AT RAPID THERMAL ANNEALING RATES

IN-SITU X-RAY DIFFRACTION AND RESISTIVITY ANALYSIS OF CoSi2 PHASE FORMATION WITH AND WITHOUT A Ti INTERLAYER AT RAPID THERMAL ANNEALING RATES

著者名:

Cabral, C., Jr.

掲載資料名:

Applications of synchrotron radiation techniques to materials science II : symposium held November 27-December 2, 1994, Boston, Massachusetts, USA

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

375

発行年:

1995

開始ページ:

253

出版情報:

Pittsburgh, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558992771 [1558992774]

言語:

英語

請求記号:

M23500/375

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00020301
シリーズID:	PA00000011
会議名:	Symposium on applications of synchrotron radiation techniques to materials science
回次:	2nd
会議開催地:	Boston, MA, USA
会議開催年:	1994.11.27-1994.12.02

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2 国際会議録 In Situ X-ray Diffraction Analysis of TiSi2 Phase Formation From a Titanium-Molybdenum Bilayer Cabral, C., Jr., Clevenger, L. A., Harper, J. M. E., Roy, R. A., Saenger, K. L., Miles, G. L., Mann, R. W. MRS - Materials Research Society	8 国際会議録 SILICIDE FORMATION IN Ti-Si AND Co-Si REACTIONS Clevenger, L. A., Hong, Q. Z., Mann, R., Harper, J. M. E., Barmak, K., Cabral, C., Jr., Nobili, C., Ottaviani, G. MRS - Materials Research Society
3 国際会議録 In-Situ Measurements During Rapid Thermal Annealing for Process Characterization Colgan, E. G., Cabral, C., Jr., Clevenger, L. A., Harper, J. M. E. MRS - Materials Research Society	9 国際会議録 In Situ Monitoring of Thin Film Reactions During Rapid Thermal Annealing: Nickel Silicide Formation Lavoje, C., Purtell, R., Cola, C., Detavernier, C., Desjardins, P., Jordan-Sweet, J., Cabral, C., Jr., d'Heurle, F.M., … Electrochemical Society
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