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IN-SITU OBSERVATION OF CHEMICAL VAPOR DEPOSITION OF THIN SiGe FILMS BY OPTICAL REFLECTION INTERFEROMETRY

著者名:
掲載資料名:
Applications of synchrotron radiation techniques to materials science II : symposium held November 27-December 2, 1994, Boston, Massachusetts, USA
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
375
発行年:
1995
開始ページ:
51
出版情報:
Pittsburgh, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992771 [1558992774]
言語:
英語
請求記号:
M23500/375
資料種別:
国際会議録

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