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Optimal design of antireflective layer for DUV lithography and experimental results

著者名:
Lee,S.G. ( Inha Univ. )
Lee,K.-I.
Seo,C.-K.
Lee,J.-U.
Choi,Y.
Nam,B.
Yu,J.Y.
Jeong,J.-K.
さらに 3 件
掲載資料名:
Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3049
発行年:
1997
開始ページ:
409
終了ページ:
418
出版情報:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819424631 [0819424633]
言語:
英語
請求記号:
P63600/3049
資料種別:
国際会議録

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