New ESCAP-type resist with enhanced etch resistance and its application to future DRAM and logic devices | 東京工業大学附属図書館文献データベース

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New ESCAP-type resist with enhanced etch resistance and its application to future DRAM and logic devices

著者名:

Conley,W. ( IBM Microelectronics Div. )

Dellaguardia,R.

Oberschmidt,J.M.

Cotler-Wagner,T.

さらに 14 件

掲載資料名:

Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3049

発行年:

1997

開始ページ:

282

終了ページ:

299

出版情報:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819424631 [0819424633]

言語:

英語

請求記号:

P63600/3049

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00020295
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in resist technology and processing
回次:	1997 : 14th
会議開催地:	Santa Clara, CA, USA
会議開催年:	1997.03.10-1997.03.12

類似資料:

1 国際会議録 Lithographic performance of an environmentally stable chemically amplified photoresist(ESCAP) Conley,W.E., Breyta,G., Brunsvold,W.R., DiPietro,R.A., Hofer,D.C., Holmes,S.J., Ito,H., Nunes,R., Fichtl,G., Hagerty,P., … SPIE-The International Society for Optical Engineering	7 国際会議録 New positive-tone deep-UV photoresist based on poly(4-hydroxystyrene) and an acid labile protecting group J.T. Fahey, W.E. Conley, W.R. Brunsvold, D.C. Yang, W.M. Moreau Society of Photo-optical Instrumentation Engineers
2 国際会議録 Challenge of 1-Gb DRAM development when using optical lithography Farrell,T.R., Nunes,R., Samuels,D.J., Thomas,A., Ferguson,R.A., Molless,A., Wong,A.K., Conley,W., Wheeler,D.C., … SPIE-The International Society for Optical Engineering	8 国際会議録 Progress toward developing high-performance 193-nm single-layer positive resist based on functionalized poly(norbornenes) Varanasi,P.R., Jordhamo,G.M., Lawson,M.C., Chen,K.-J., Brunsvold,W.R., Hughes,T., Keller,R., Khojasteh,M., Li,W., … SPIE - The International Society for Optical Engineering
3 国際会議録 Material design and development for aqueous base compatible high-performance deep UV negative-tone resists Varanasi, Pushkara Rao, Ito, Hiroshi, Brock, Phil, Breyta, Gregory, Brunsvold, William R., Katnani, Ahmad D. American Chemical Society	9 国際会議録 Approaches to etch-resistant 193-nm photoresists: performance and prospects Allen, R. D., Opitz, J., Ito, H., Wallow, T. I., Casmier, D. V., DiPietro, R. A., Brock, P. J., Breyta, G., … SPIE - The International Society of Optical Engineering
4 国際会議録 Contact Processes For Advanced DRAM And CMOS Logic Devices* Gambino, J., Bandy, K., Chapple-Sokol, J., Conti, R., Dobuzinsky, D., Iggulden, R., Maldei, M., Peterson, K., Rupp, T., … Electrochemical Society	10 国際会議録 Process optimization of a positive-tone chemically amplified resist for 0.25-µm lithography using a vector scan e-beam tool A.D. Katnani, D. Schepis, R.W. Kwong, W. Huang, Z.C.H. Tan Society of Photo-optical Instrumentation Engineers
5 国際会議録 Nonchemically amplified positive photoresist for synchrotron radiation x-ray lithography D. Bucca, A. Aviram, D.E. Seeger, W.E. Conley, W.R. Brunsvold Society of Photo-optical Instrumentation Engineers	11 国際会議録 Fabrication of 64-Mb DRAM using x-ray lithography R. DellaGuardia, C. Wasik, D. Puisto, R. Fair, L.W. Liebmann Society of Photo-optical Instrumentation Engineers
6 国際会議録 Viability of conventional high-NA KrF imaging for sub-0.25-ｦﾌm lithography Farrell,T.R., Nunes,R., Campbell,R., Hoh,P., Samuels,D.J., Kirk,J.P., Conley,W.E., Iba,J., Shibata,T. SPIE-The International Society for Optical Engineering	12 国際会議録 XMM Monitoring of the Eclipsing Polar HU Aquarii R. Schwarz, A.D. Schwope, V.S. Dhillon, T.R. Marsh ESA Publications Division

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