Probe-beam scan-type autofocus system using position-sensing detector for subhalf micrometer lithography tools

Probe-beam scan-type autofocus system using position-sensing detector for subhalf micrometer lithography tools

著者名:

Kim,D.H. ( Electronics and Telecommunications Research Institute )
Nam,B.-H.
Lee,K.H.
Chung,H.B.
Yoo,H.J.

掲載資料名:

Optical Microlithography IX

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

2726

発行年:

1996

巻:

Part2

開始ページ:

876

終了ページ:

885

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819421029 [0819421022]

言語:

英語

請求記号:

P63600/2726

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00020263
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical Microlithography
回次:	1996 : 9th
会議開催地:	Santa Clara, CA, USA
会議開催年:	1996.03.13-1996.03.15

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1 国際会議録 Catadioptric Systems for Sub-Quarter Micron Lithography, Lee,K.H., Chung,H.B., Kim,D.H., Yoo,H.J. SPIE-The International Society for Optical Engineering	7 国際会議録 Optimization of electron-beam lithography for super-low-noise HEMTs Choi,S.-S., Lee,J.-H., Yun,H.S., Chung,H.B., Lee,S.Y., Yoo,H.J. SPIE-The International Society for Optical Engineering
2 国際会議録 Performance analysis of ArF excimer laser lithography optics Lee,K.H., Kim,D.H., Kim,J.S., Chung,H.B., Yoo,H.J. SPIE-The International Society for Optical Engineering	8 国際会議録 Chromatic aberration-free TTL alignment system for 193-nm step-and-scan exposure system by using phase conjugate waves Kwon,J.H., Sohn,Y.J., Hwang,H.C., Kim,D.H., Chung,H.B. SPIE-The International Society for Optical Engineering
3 国際会議録 Alignment system for ArF excimer-laser-based step-and-scan system Kim,D.H., Kim,J.S., Sohn,Y.J., Kwon,J.H., Lee,K.H., Choi,S.-S., Chung,H.B., Yoo,H.J., Kim,B.W. SPIE-The International Society for Optical Engineering	9 国際会議録 Damage characterization of SiN x-ray mask membrane caused by electron-beam exposure Choi,S.-S., Jeon,Y.J., Kim,J.-S., Chung,H.B., Lee,S.Y., Lee,J.H., Yoo,H.J. SPIE-The International Society for Optical Engineering
4 国際会議録 Design of illumination system for ArF excimer laser step-and-scanner Lee,K.H., Kim,D.H., Kim,J.S., Choi,S.-S., Chung,H.B., Yoo,H.J., Kim,B.W. SPIE-The International Society for Optical Engineering	10 国際会議録 Design of illumination aperture for ArF exposure system with wide exposing latitude Choi,S.-S., Cha,H.S., Kim,J.-S., Lee,K.H., Kim,D.H., Chung,H.B., Kim,D.Y. SPIE - The International Society for Optical Engineering
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