Micrascan III:0.25-ｦﾌm resolution step-and-scan system | 東京工業大学附属図書館文献データベース

Blank Cover Image

Micrascan III:0.25-ｦﾌm resolution step-and-scan system

著者名:

Williamson,D.M. ( Silicon Valley Group Lithography Systems,Inc. )

McCullough,A.W.

さらに 6 件

掲載資料名:

Optical Microlithography IX

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

2726

発行年:

1996

巻:

Part2

開始ページ:

780

終了ページ:

786

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819421029 [0819421022]

言語:

英語

請求記号:

P63600/2726

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00020263
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical Microlithography
回次:	1996 : 9th
会議開催地:	Santa Clara, CA, USA
会議開催年:	1996.03.13-1996.03.15

類似資料:

1 国際会議録 Micrascan III:performance of a third-generation catadioptric step-and-scan lithographic tool Cote,D.R., Andresen,K.W., Cronin,D.J., Harrold,H., Himel,M.D., Kane,J., Lyons,J., Markoya,L., Mason,C., McCafferty,D.C., … SPIE-The International Society for Optical Engineering	7 国際会議録 Characterization of gate electrode etch process for 0.25 ｦﾌm extended to 0.18 ｦﾌm Gerung,H., Chhagan,V.K., Yelehanka,P.R., Zhou,M.S., Hui,J.K.L. SPIE - The International Society for Optical Engineering
2 国際会議録 NA/o optimization strategies for an advanced DUV stepper applied to 0.25-ｦﾌm and sub-0.25-ｦﾌm critical levels Beeck,M.Op de, Ronse,K., Ghandehari,K., Jaenen,P., Botermans,H., Finders,J., Lilygren,J.A., Baker,D.C., Vandenberghe,G., … SPIE-The International Society for Optical Engineering	8 国際会議録 Merged 2.5-V and 3.3-V 0.25-ｦﾌm CMOS technology Kizilyalli,I.C., Huang,R.Y., Hwang,D., Kane,B.C., Ashton,R., Kuehne,S., Deng,X., Twiford,M.S., Martin,E.P., … SPIE-The International Society for Optical Engineering
3 国際会議録 Scaling self-aligned contacts for 0.25ｦﾌ m and below Perera,A., Pfiester,J.R., Lii,T., Feng,C., Bhat,M., Dao,T., Molloy,J., Blackwell,M., J. Cecil, SPIE-The International Society for Optical Engineering	9 国際会議録 Characterization of positive DUV resists at 0.25-ｦﾌm polygate using organic and inorganic antireflection schemes Dass,S.K., Orvek,K.J., Gruber,L., Broomfield,M.C., Tremblay,J., Piasecki,M. SPIE-The International Society for Optical Engineering
4 国際会議録 Silicide Contacts for Sub-0.25 ｦﾌm Devices Chen, L. J., Cheng, S. L., Chang, S. M., Peng, Y. C., Huang, H. Y., Cheng, L. W. MRS - Materials Research Society	10 国際会議録 Application of deep-UV resist for 0.25-ｦﾌm metal and poly processing Krisa,W.L., Progler,C.J., Brennan,K., Schell,J.C. SPIE-The International Society for Optical Engineering
5 国際会議録 Integration of Multi-Level Copper Metallization into a High-Performance Sub-0.25 ｦﾌm Technology Venkatraman, R., Jain, A., Farkas, J., Mendonca, J., Hamilton, G., Capasso, C., Denning, D., Simpson, C., Rogers, B., … MRS - Materials Research Society	11 国際会議録 Critical structure characterization in 0.25-ｦﾌm metal masking Lee,C.Y., Ma,W.W., Sajan,M.R., Cheng,A. SPIE - The International Society for Optical Engineering
6 国際会議録 High-performance 0.25-ｦﾌm CMOS technology for fast SRAMs Hayden,J.D., McNelly,T.F., Perera,A.H., Pfiester,J.R., Subramanian,C.K., Thompson,M.A. SPIE-The International Society for Optical Engineering	12 国際会議録 Bottom-ARC optimization methodology for O.25-ｦﾌm lithography and beyond Op,de,Beeck,M., Vandenberghe,G., Jaenen,P., Zhang,F.-H., Delvaux,C., Richardson,P., van,Puyenbroeck,I., Ronse,K., … SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12