Migrating deep-UV lithography to the 0.25-ヲフm regime:issues and outlook
- 著者名:
Orvek,K.J. ( Digital Equipment Corp. ) Dass,S.K. Gruber,L. Dumford,S.A. Piasecki,M. Pollard,G.W. Fink,I.D. - 掲載資料名:
- Optical Microlithography IX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 2726
- 発行年:
- 1996
- 巻:
- Part1
- 開始ページ:
- 398
- 終了ページ:
- 409
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819421029 [0819421022]
- 言語:
- 英語
- 請求記号:
- P63600/2726
- 資料種別:
- 国際会議録
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