Top-surface imaging and optical proximity correction:a way to 0.18-ヲフm lithography at 248 nm
- 著者名:
Goethals,A.M. ( IMEC ) Vertommen,J. Roey,F.Van Yen,A. Tritchkov,A. Ronse,K. Jonckheere,R. hove,L.Van den - 掲載資料名:
- Optical Microlithography IX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 2726
- 発行年:
- 1996
- 巻:
- Part1
- 開始ページ:
- 362
- 終了ページ:
- 374
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819421029 [0819421022]
- 言語:
- 英語
- 請求記号:
- P63600/2726
- 資料種別:
- 国際会議録
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