Mathematical and CAD framework for proximity correction

Mathematical and CAD framework for proximity correction

著者名:

Cobb,N.B. ( Univ.of California/Berkeley )
Zakhor,A.
Miloslavsky,E.

掲載資料名:

Optical Microlithography IX

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

2726

発行年:

1996

巻:

Part1

開始ページ:

208

終了ページ:

222

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819421029 [0819421022]

言語:

英語

請求記号:

P63600/2726

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00020263
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical Microlithography
回次:	1996 : 9th
会議開催地:	Santa Clara, CA, USA
会議開催年:	1996.03.13-1996.03.15

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1 国際会議録 Experimental results on optical proximity correction with variable-threshold resist model Cobb,N.B., Zakhor,A., Reihani,M., Jahansooz,F., Raghavan,V.N. SPIE-The International Society for Optical Engineering	7 国際会議録 Optical proximity correction with principal component regression P. Gao, A. Gu, A. Zakhor Society of Photo-optical Instrumentation Engineers
2 国際会議録 Fast, low-complexity mask design N.B. Cobb, A. Zakhor Society of Photo-optical Instrumentation Engineers	8 国際会議録 Effects of advanced illumination schemes on design manufacturability and interactions with optical proximity corrections Capodieci,L., Torres,J.A., Socha,R.J., Hollerbach,U., Chen,J.F., Os,C.van, Granik,Yu., Toublan,O., Cobb,N.B. SPIE-The International Society for Optical Engineering
3 国際会議録 Fast sparse aerial-image calculation for OPC Cobb,N.B., Zakhor,A. SPIE-The International Society for Optical Engineering	9 国際会議録 Integration of optical proximity correction strategies in strong phase shifters design for poly-gate layers Spence,C.A., Plat,M.V., Sahouria,E.Y., Cobb,N.B., Schellenberg,F.M. SPIE - The International Society for Optical Engineering
4 国際会議録 Flows for model-based layout correction of mask proximity effects Cobb, N.B., Maurer, W. SPIE - The International Society of Optical Engineering	10 国際会議録 Integration of optical proximity correction strategies in strong phase-shifter design for polygate layers Spence,C.A., Plat,M.V., Sahouria,E.Y., Cobb,N.B., Schellendberg,F.M. SPIE - The International Society for Optical Engineering
5 国際会議録 Flexible MRC rules for OPC Cobb, N. B., Miloslavsky, E., Lippincott, G. SPIE - The International Society of Optical Engineering	11 国際会議録 Fully automatic side lobe detection and correction technique for attenuated phase-shift masks Toublan,O., Cobb,N.B., Sahouria,E.Y. SPIE-The International Society for Optical Engineering
6 国際会議録 Phase aware proximity correction for advanced masks Toublan,O., Sahouria,E.Y., Cobb,N.B., Do,T., Donnelly,T., Granik,Y., Schellenberg,F.M., Schiavone,P. SPIE - The International Society for Optical Engineering	12 国際会議録 Extreme mask corrections: technology and benefits Y. Granik, N. Cobb, D. Medvedev Society of Photo-optical Instrumentation Engineers

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