Viability of conventional high-NA KrF imaging for sub-0.25-ヲフm lithography
- 著者名:
Farrell,T.R. ( IBM Corp. ) Nunes,R. Campbell,R. Hoh,P. Samuels,D.J. Kirk,J.P. Conley,W.E. Iba,J. Shibata,T. - 掲載資料名:
- Optical Microlithography IX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 2726
- 発行年:
- 1996
- 巻:
- Part1
- 開始ページ:
- 46
- 終了ページ:
- 53
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819421029 [0819421022]
- 言語:
- 英語
- 請求記号:
- P63600/2726
- 資料種別:
- 国際会議録
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4
国際会議録
Optical proximity effects correction at 0.25ヲフm incorporating process variations in lithography
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |