Blank Cover Image

Properties of Recrystallized Amorphous Silicon Prepared by XeCl Excimer Laser Irradiation

著者名:
Ulrych,I.
El-Kader,K.M.A.
Chab,V.
Kocka,J.
Prikryl,P.
Vydra,V.
Cemy,R.
さらに 2 件
掲載資料名:
Semiconductor processing and characterization with lasers : applications in photovoltaics : proceedings of the First International Symposium, Stuttgart, Germany, April 18-20, 1994
シリーズ名:
Materials science forum
シリーズ巻号:
173-174
発行年:
1995
開始ページ:
29
終了ページ:
34
出版情報:
Zurich, Switzerland: Trans Tech Publications
ISSN:
02555476
ISBN:
9780878496839 [0878496831]
言語:
英語
請求記号:
M23650
資料種別:
国際会議録

類似資料:

1 国際会議録 KINETICS OF Ni SILICIDES SYNTHESIS WITH EXCIMER LASER PULSES STUDIED BY TRR

Cerny, R., Prikryl, P., El-Kader, K. M. A., Engst, P., Kubat, P., Chab, V.

MRS - Materials Research Society
7 国際会議録 Investigation into the interaction of a XeCl excimer laser with hard tissue

Murray,A.K., Dickinson,M.R.

SPIE - The International Society for Optical Engineering
2 国際会議録 Phase transformations induced in CdTe single crystal by ruby laser pulsed irradiation

Ivlev, G.D., Gatskevich, E.I., Zhvavyi, S.P., Cerny, R., Prikryl, P., Chab, V., Cibulka, O.E.
8 国際会議録 High-speed drilling of metals with a long-pulse XeCl excimer laser

Schoonderbeek, A., Biesheuvel, C.A., Hofstra, R.M., Boller, K.-J., Meijer, J.

SPIE-The International Society for Optical Engineering
3 国際会議録 XeCl-excimer laser-MOPA chain for shock hardening

Hintz,G., Tkotz,R., Keusch,C., Negendanck,M., Staudigel,J., Christiansen,J., Hoffmann,D.H.H., Eisner,K., Lang,A., …

SPIE-The International Society for Optical Engineering
9 国際会議録 Large grain creation and destruction in excimer laser crystallized amorphous silicon

Boyce, J. B., Anderson, G. B., Fork, D. K., Johnson, R. I., Mei, P., Ready, S. E.

MRS - Materials Research Society
4 国際会議録 Improved Efficiency in Hydrogenated Amorphous Silicon Solar Cells Irradiated by Excimer Laser

Damitha, A. A., Adikaari, T., Silva, S.Ravi P., Kearney, Michael J., Shannon, John M.

Materials Research Society
10 国際会議録 Processing and properties of CW laser-recrystallized silicon films on amorphous substrates

Johnson, N.M., Biegelsen, D.K., Moyer, M.D.

North Holland
5 国際会議録 Enhancement of Crystallinity with Fluorinated Amorphous Silicon (a-Si:H;F) Film by XeCl Excimer Laser Annealing

Choi, H. S., Jang, K. H., Kim, K. B., Han, M. K.

MRS - Materials Research Society
11 国際会議録 Single Shot Excimer Laser Annealing of Amorphous Silicon: Effect of Hydrogen on the Properties of the Polysilicon

Boher, P., Stehle, M., Godard, B., Stehle, J. L.

MRS - Materials Research Society
6 国際会議録 The Recrystallization Depth Control of the Excimer-Laser- Recrystallized Polycrystalline Silicon Film

Choi, K-Y., Han, M-K., Jeon, J-H., Lee, M-C., Park, K-C.

Materials Research Society
12 国際会議録 Surface morphology and recrystallization behavior of amorphous Si after ArF laser-irradiation

Chen, T.T., Chang, C.Y., Chao, C.L., Ma, K.J., Liu, Y.M., Chen, Y.T., Lin, C.W.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12