Monoenergetic Positron Beam Study of Heavily Si-doped GaAs Grown by MOCVD using Tertiarybutylarsine
- 著者名:
Chichibu,S. Iwai,A. Nakahara,Y. Matsumoto,S. Higuchi,H. Wei,L. Tanigawa,S. - 掲載資料名:
- Shallow Impurities in Semiconductors : Proceedings of the Fifth International Conference on Shallow Impurities in Semiconductors "Physics and Control of Impurities", International Conference Center Kobe, Japan, 5 to 8 August, 1992
- シリーズ名:
- Materials science forum
- シリーズ巻号:
- 117-118
- 発行年:
- 1993
- 開始ページ:
- 315
- 終了ページ:
- 320
- 出版情報:
- Aedermannsdorf, Switzerland: Trans Tech Publications
- ISSN:
- 02555476
- ISBN:
- 9780878496549 [0878496548]
- 言語:
- 英語
- 請求記号:
- M23650
- 資料種別:
- 国際会議録
類似資料:
Materials Research Society |
Trans Tech Publications |
Trans Tech Publications |
Materials Research Society |
Materials Research Society |
Trans Tech Publications |
4
国際会議録
Heavily Arsenic Doping into Si by ArF Excimer Laser Irradiation using Tertiarybutylarsine(tBAS)
Trans Tech Publications |
10
国際会議録
The Study of Defects Induced by the Implantation of O Ions into GaAs by a Slow Positron Beam
Trans Tech Publications |
5
国際会議録
Monoenergetic Positron Beam Studies of Near Surface Defects Induced by Low Dose Be-Implantation
Trans Tech Publications |
Materials Research Society |
Trans Tech Publications |
Materials Research Society |